EUV Sources and Optics

Fraunhofer ILT develops compact plasma-based sources that emit intense, short-wavelength radiation in the extreme ultraviolet or soft X-ray range. The radiation with wavelengths in the range between 2 nm and 50 nm is usually generated in gas discharges or by irradiating a target with pulsed laser radiation.

The radiation sources and corresponding optical systems developed at ILT can be used, for example, to characterize optics, conduct contamination studies or develop new photoresists and enable accelerated lifetime testing. In addition, ultrathin membranes, multilayer systems with individual layer thicknesses of less than 1 nm and periodic lattice structures can be characterized with EUV radiation with respect to their geometry down to the subnanometer range. Stoichiometry analyses of membrane samples and multilayer systems can also be conducted.

The institute’s research focuses on laser- and discharge-based excitation of plasmas for the spectroscopic analysis of materials and for the treatment of surfaces. In particular, the semiconductor industry increasingly needs radiation at a wavelength of 13.5 nm for chip production.

The range of services we offer includes feasibility studies, the development of application-adapted radiation sources, optics and processes, integration into higher-level systems as well as individual consulting. Furthermore, Fraunhofer ILT offers research and development services in the field of EUV technology where we not only bring together considerable expertise, but also have access to a unique inventory.

Plasma-Based EUV Beam Sources

• Radiation sources for EUV lithography
• Radiation sources for X-ray microscopy
• Power electronics
• Generators for high pulsed currents, fast data acquisition and control of pulsed radiation sources

Plasma Generation and Diagnostics

• Gas discharge and laser induced plasmas
• Spectroscopy from the soft X-ray to the IR range
• Analysis of radiation fluxes
• Analysis of plasma parameters
• High-speed photography
• Plasma modeling

System Solutions

• Design of optical systems for EUV applications
• Optics simulation
• Integration of plasma-based radiation sources
• Realization of complete systems
• Systems for accelerated lifetime testing of EUV components

Applications with EUV Radiation

• X-ray microscopy
• EUV microscopy for mask inspection
• EUV reflectometry, analysis of surfaces and layer systems
• Nanostructuring with interference lithography

Lüttgenau, B., Brose, S., Choi, S., Panitzek, D., Danylyuk, S., Lebert, R., Stollenwerk, J., Loosen, P.:
Design and realization of an industrial stand-alone EUV resist qualification setup.
SPIE Photomask Technology + EUV Lithography, 2020, Online Only. Extreme Ultraviolet Lithography 2020 (Proc. SPIE 2020), 115171 , 115171F (12 S.),(2020)
http://dx.doi.org/10.1117/12.2572803

Schröder, S., Bahrenberg, L., Eryilmaz, N. K., Glabisch, S., Danylyuk, S., Brose, S., Stollenwerk, J., Loosen, P.:
Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings.
SPIE Photomask Technology + EUV Lithography, 2020, Online Only. Extreme Ultraviolet Lithography 2020 (Proc. SPIE 2020), 11517, 115170S (2020)
https://doi.org/10.1117/12.2573148

von Wezyk, A., Andrianov, K., Wilhein, T., Bergmann, K.:
Target materials for efficient plasma-based extreme ultraviolet sources in the range of 6 to 8 nm.
Journal of Physics D: Applied Physics 52, 505202- (2019)
https://doi.org/10.1088/1361-6463/ab4317 (Open Access)

Bahrenberg, L., Danylyuk, S., Michels, R., Glabisch, S., Ghafoori, M., Brose, S., Stollenwerk, J., Peter Loosen, P.:
Spectroscopic reflectometry in the extreme ultraviolet for critical dimension metrology.
SPIE Advanced Lithography 2019, San Jose, 24-28 February 2019, San Jose, California. Metrology, Inspection, and Process Control for Microlithography XXXIII (Proc. of SPIE), 109591X, (6 S.) (2019)
https://doi.org/10.1117/12.2513173

Brose, S., Danylyuk, S., Grüneberger, F., Gerngroß, M., Stollenwerk, J.,  Schirmer, M., Loosen, P.:
Industrial photoresist development with the EUV laboratory exposure tool: mask fabrication, sensitivity and contrast.
SPIE Photomask Technology + EUV, 2019, Monterey, CA, 15-19 September 2019. International Conference on Extreme Ultraviolet Lithography 2019 (Proc. of SPIE) 11147, 111471I- (9 S.), (2019).
https://doi.org/10.1117/12.2536794

Bahrenberg, L., Danylyuk, S., Michels, R., Glabisch, S., Ghafoori, M., Brose, S., Stollenwerk, J., Peter Loosen, P.:
Spectroscopic reflectometry in the extreme ultraviolet for critical dimension metrology.
SPIE Advanced Lithography 2019, San Jose, 24-28 February 2019, San Jose, California. Metrology, Inspection, and Process Control for Microlithography XXXIII (Proc. of SPIE), 109591X, (6 S.) (2019)
https://doi.org/10.1117/12.2513173

Bußmann, J., Odstrčil, M., Teramoto, Y., Juschkin, L.:
Ptychographic imaging with partially coherent plasma EUV sources.
Advanced Optical Technologies 6 (6), 459-466 (2017)

Bahrenberg, L., Herbert, S., Mathmann, T., Danylyuk, S., Stollenwerk, J.H., Loosen, P.:
Design of structured YAG:Ce scintillators with enhanced outcoupling for image detection in the extreme ultraviolet.
Opt. Let. 42, 3848-3851 (2017)

Brose, B., Danylyuka, S., Bahrenberg, L., Lebertc, R., Loosen, P., Juschkin, L.:
Optimized phase-shifting masks for high-resolution resist patterning by interference lithography.
International Conference on Extreme Ultraviolet Lithography 2017, September 11 - 14, 2017Monterey, CA.
Proc. of SPIE Vol. 10450, (12 S.) (2017)

Bahrenberg, L., Danylyuk, S., Brose, S., Pollentierc, I., Timmermansc, M.,
Gallagherc, E., Stollenwerk, J., Loosen, P.
Characterization of pellicle membranes by lab-based spectroscopic reflectance and transmittance measurements in the extreme ultraviolet.
International Conference on Extreme Ultraviolet Lithography 2017, September 11 - 14, 2017 Monterey, CA.
Proc. of SPIE Vol.10450, (7 S.) (2017)

Vieker, J.,Bergmann, K.:
Influence of the electrode wear on the EUV generation of a discharge based extreme ultraviolet light source
JOURNAL OF APPLIED PHYSICS 50, 345601- (2017)

Wilson, D , Schmitz, C. , Rudolf, D , Wiemann, C , Plucinski, L. , Riess, S. , Schuck, M. , Hardtdegen, H. , Schneider, C. M. , Tautz, F. S., Juschkin, L. :
Compact extreme ultaviolet source for laboratory-based photoemission spectromicroscopy
JARA FIT Annual Report 2015, 151-152 (2016)

Maryasov, O., Juschkin, L.:
Table-top EUV scatterometer MARYS with high-brightness discharge plasma source
JARA-FIT Annual Report 2015, 149-150, (2016)

Carstens, H., Högner, M., Saule, T., Holzberger, S., Lilienfein, N., Guggenmos, A., Jocher, C., Eidam, T., Esser, D., Tosa, V., Pervak, V., Limpert, J., Tünnermann A., Kleineberg, U., Krausz, F., Pupeza, I.:
Cavity-enhanced high-harmonic generation at 250 MHz
High Intensity Lasers and High Field Phenomena 2016.  Long Beach, California, United States, 20–22 March 2016. Paper HM6B.6., (2 S.) (2016)

Schmitz, C., Wilson, D., Rudolf, D., Wiemann, C., Plucinski, L., Riess, S., Schuck, M., Hardtdegen, H., Schneider, C. M., Tautz, F. S., Juschkin, L.:
Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy
Appl. Phys. Lett. 108, 234101 (5 S.) (2016)

Baksh, P.D., Odstrčil, M., Kim, H.-S., Boden, S. A., Frey, J. G., Brocklesby, W.S.:
Wide-field broadband extreme ultraviolet transmission ptychography using a high-harmonic source
Opt. Lett. 41 (13), 1317-1320 (2016)

Baksh, P.D., Odstrčil, M., Kim, H.-S., Boden, S. A., Frey, J. G., Brocklesby, W.S.:
Wide-field broadband extreme ultraviolet transmission ptychography using a high-harmonic source: publisher’s note
Opt. Lett. 41 (13), 3057 (2016)

Bergmann, K., Vieker, J., von Wezyk, A.:
Investigations on the emission in the extreme ultraviolet of a pseudospark based discharge light source
J. Appl. Phys. 120, 143302 (5 S.) (2016)

Beyene, G. A., Tobin, I., Juschkin, L., Hayden, P., O'Sullivan, G., Sokell, E., Zakharov, V. S., Zakharov, S. V., O'Reilly, F.:
Laser-assisted vacuum arc extreme ultraviolet source: a comparison of picosecond and nanosecond laser triggering
J. Phys. D: Appl. Phys. 49, 225201 (10 S.) (2016)

Brose, S., Danylyuk, S., Tempeler, J., Kim, Hyun-su, Loosen, P., Juschkin, L.:
Enabling laboratory EUV research with a compact exposure tool
Proc. SPIE 9776 (17 S.) (2016)

Bußmann, J., Odstrcil, M., Bresenitz, R., Rudolf, D., Miao, J., Brocklesby, W.S., Juschkin, L.:
Coherent Diffractive Imaging with a Laboratory-Scale, Gas-Discharge Plasma Extreme Ultraviolet Light Source.
 X-Ray Lasers 2014. Proceedings of the 14th International Conference on X-Ray Lasers. J. Rocca, C. Menoni, M. Marconi (Eds.). Cham: Springer (2016). Springer Proceedings in Physics. 216, 275-280, (2016)

Carstens, H., Högner, M., Saule, T., Holzberger, S., Lilienfein, N., Guggenmos, A, Jocher, C., Eidam, T., Esser, D., Tosa, V. , Pervak, V., Limpert, J., Tünnermann, A., Kleineberg, U., Krausz, F., Pupeza, I.:
High-harmonic generation at 250  MHz with photon energies exceeding 100  eV.
Optica 3 Nr. 4, 366-369 (2016)

Kim, H., Baksh, P., Odstrcil,M., Miszczak, M., Frey, J. G., Juschkin, L., Brocklesby, W. S.:
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Appl. Phys. Expr. 9, 7, 76701 (4 S.) (2016)

Kim, H., Danylyuk, S., Brocklesby, W. S., Juschkin, L.:
Single exposure imaging of Talbot carpets and resolution characterization of detectors for micro- and nano- patterns
J. Opt. Soc. Korea 20, (2) 245-250 (2016)

Kim, H., Danylyuk, S., Brose, S., Loosen, P., Bergmann, K., Brocklesby, W.S., Juschkin, L.:
Lensless proximity EUV lithography with a Xenon gas discharge plasma radiation
Proceedings of the 14th International Conference on X-Ray Lasers. J. Rocca, C. Menoni, M. Marconi (Eds.), 313-319, Springer Proceedings in Physics 216 (2016)

Kim, H., Li, W., Marconi, M. C., Brocklesby, W. S., Juschkin, L.:
Restorative self-image of rough-line grids: Application to Coherent EUV Talbot lithography
IEEE Photonics J. 8 (3), 2600209 (9 S.) (2016)

Schmitz, C., Wilson, D., Rudolf, D., Wiemann, C., Plucinski, L., Riess, S., Schuck, M., Hardtdegen, H., Schneider, C. M., Tautz, F. S., Juschkin, L.:
Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy
Appl. Phys. Lett. 108, 234101 (5 S.) (2016)

Sertsu, M. G., Giglia, A., Brose, S., Park, D., Wang, Z. S., Mayer, J., Juschkin, L., Nicolosi, P.:
Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths
J. Appl. Phys. 119, 095301 (7 S.) (2016)

Bahrenberg, L., Herbert, S., Tempeler, J., Maryasov, A., Hofmann, O., Danylyuk, S., Lebert, R., Loosen, P., Juschkin, L.:
Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope
Proceedings of SPIE 9422, (9 S.) (2015)

Danylyuk, S., Herbert, S., Loosen, P., Lebert, R., Schäfer, A., Schubert, J., Tryus, M., Juschkin, L.:
Multi-angle spectroscopic extreme ultraviolet reflectometry for analysis of thin films and interfaces
Phys. Stat. Sol. C 12 (3), 318-322 (2015)

Herbert, S., Bahrenberg, L., Maryasov, A., Danylyuk, S., Loosen, P., Juschkin, L., Bergmann, K., Lebert, R.:
Table-Top EUV and Soft X-Ray Microscopy
Imaging & Microsc. 2015 (May 26), 3 S. (2015)

Kunkemöller, G., Maß, T. W. W., Michel, A.-K. U., Kim, H.-S., Brose, S., Danylyuk, S., Taubner, T., Juschkin, L.:
Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas
Opt. Expr. 23 (20), 25487-25495 (2015)

Reininghaus, M., Ivanov, D., Maß, T.W.W., Eckert, S., Juschkin, L., Garcia, M. E., Taubner, T., Poprawe, R.:
Nanophotonic applications of fs-laser radiation induced nanostructures and their theoretical description
In: Optically Induced Nanostructures,
Hrsg. v. König, Karsten / Ostendorf, Andreas, Berlin,
De Gruyter, 25-46 (2015)

Rudolf, D., Bußmann, J., Odstrcil, M., Dong, M., Bergmann, K., Danylyuk, D., Juschkin, L.:
Interferometric broadband Fourier spectroscopy with a partially coherent gas-discharge extreme ultraviolet light source 
Optics Letters 40, 2818-2821 (2015)

Teramoto, Y., Santos, B., Mertens, G., Kops, R., Kops, M., von Wezyk, A.,
Yabuta, H., Nagano, A., Shirai, T., Ashizawa, N., Nakamura, K., Kasama, K.:
High-radiance LDP source for mask-inspection application
Proc. SPIE 9422, 94220F, (9 S.) (2015)

Wilson, D., Rudolf, D., Weier, C., Adam, R., Winkler, G., Frömter, R., Danylyuk, S., Bergmann, K., Grützmacher, D., Schneider, C. M., Juschkin, L.:
Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies
Rev. Scient. Instr. 85 (10), 103110 (9 S.) (2014)

Danylyuk, S., Kim, H., Brose, S., Dittberner, C., Loosen, P., Taubner, T., Bergmann, K., Juschkin, L.:
Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays
J. Vac. Sci. Technol. B 31(2), 21602/1-21602/6 (2013)

Danylyuk, S., Loosen, P., Bergmann, K., Kim, H., Juschkin, L.:
Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources
J. Micro/Nanolith. MEMS MOEMS 12, 033002 (7 S.), (2013)

Juschkin, L., Lötgering, L., Rudolf, D., Xu, R., Brose, S., Danylyuk, S., Miao, J.:
Tabletop coherent diffraction imaging with a discharge plasma EUV source 
Proc. SPIE 8849, 88490Y (9 S.) (2013)

Brose, S., Danylyuk, S., Juschkin, L., Dittberner, C., Bergmann, K., Moers, J., Panaitov, G., Trellenkamp, St., Loosen, P., Grützmacher, D.:
Broadband transmission masks, gratings and filters for extreme ultaviolet and soft X-ray lithography
Thin Solid Films 520, 5080-5085, (2012)

Freiberger, R., Hauck, J., Lvovsly, D., Adam, R., Danylyuk, S., Juschkin, L.:
Gateable micro channel plate detector for extreme ultraviolet radiation with high temporal resolution
JARA FIT Jülich-Aachen Research Alliance - Annual Report 2011
145-146, (2012)

Herbert, S., Banyay, M., Maryasov, A. P., Hochschulz, F., Paschen, U., Vogt, H., Juschkin, L.
Quantum efficiency determination of a novel CMOS design for fast imaging applications in the extreme ultraviolet 
IEEE Transact. Electron Dev. Online first (4 S.), (2012)

Farahzadi, A., Lebert, R., Benk, M., Juschkin, L., Herbert, S., Maryasov, A.:
Contributions to EUV mask metrology infrastructure 
Proc. SPIE 7545, 754505, (5 S.) (2011)

Freiberger, R., Hauck, J., Reininghaus, M., Wortmann, D., Juschkin, L.:
Time resolved EUV pump-probe microscopy of fs-LASER induced nanostructure formation 
Proc. SPIE 8076, 80760K, (7 S.) (2011)

Hauck, J., Freiberger, R., Juschkin, L.:
Performance benchmark of a gateable microchannel plate detector for extreme ultraviolet radiation with high temporal resolution. 
Proc. SPIE 8076, 80760R, (7 S.) (2011)

Juschkin, L., Maryasov, A., Herbert, S., Aretz, A., Bergmann, K., Lebert, R.:
EUV dark-field microscopy for defect inspection. 
AIP Conf. Proc. 1365, 265-268, (2011)

Maryasov, A., Herbert, S., Juschkin, L., Lebert, R., Bergmann, R.:
EUV actinic mask blank defect inspection: results and status of concept realization. 
Proc. SPIE 7985, 79850C, (8 S.) (2011)

Banyay, M., Juschkin, L.
Spectral sharpening algorithm for a polychromatic reflectometer in the extreme ultraviolet
Appl. Spectrosc. 64, 401-408, (2010)

Verbraak, H., Küpper, F., Jonkers, J., Bergmann, K.
Angular ion emission characteristics of a laser triggered tin vacuum arc as light source for extreme ultraviolet lithography 
J. Appl. Phys. 93304, (6 S.) (2010)

Wortmann, D., Reininghaus, M., Juschkin, L., Freiberger, R.:
EUV-pump-probe microscopy of FS-Laser induced nano-structure formation
ICALEO 2010. 29th International Congress on Applications of Lasers & Electro Optics, Anaheim/Ca., September 26-30, 2010. N107, (4 S.) (2010)

Benk, M., Bergmann, K.:
Adaptive spatially resolving detector for the extreme ultraviolet with absolute measuring capability
Rev. Sci. Instr. 80, 331131-331136, (2009)

Banyay, M., Juschkin, L., Loosen, P., Roeckerath, M., Schubert, J.:
Characterization of ultra-thin layers in MOS-devices with XUV reflectometry
JARA FIT Jülich-Aachen Research Alliance for Fundamentals of Future Information Technology - Annual Report 2008, pp. 47-48, (2009)

Juschkin, L., Freiberger, R., Bergmann, K.:
EUV microscopy for defect inspection by dark-field mapping and zone plate zooming
J. Phys.: Conf. Ser. 186, (3S.), (2009)

Benk, M., Schäfer, D., Wilhein, T., Bergmann, K.:
High power soft x-ray source based on a discharge plasma
J. Phys.: Conf. Ser. 186, 012024 (3 S.) (2009)

Banyay, M., Brose, S., Juschkin, L.:
Line image sensors for spectroscopic applications in the extreme ultraviolet
Meas. Sci. Technol. 20, 105201, (5 S.), (2009)

Schäfer, D., Benk, M., Bergmann, K., Nisius, T., Wiesemann, U., Wilhein, T.:
Optical setup for tabletop soft X-ray microscopy using electrical discharge sources
J. Phys.: Conf. Ser. 186, 063507, (3 S.) (2009)

Bergmann, K., Danylyuk, S.V., Juschkin, L.:
Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm
J. Appl. Phys. 106, 073309, (5 S.) (2009)

Banyay, M., Juschkin, L.:
Table-top reflectometer in the extreme ultraviolet for surface sensitive analysis
Appl. Phys. Lett. 94, (3 S.) (2009)

Juschkin, L., Freiberger, R.:
Two magnification steps EUV microscopy with a Schwarzschild objective and an adapted zone plate lens
Proc. SPIE 7360, 736005, (8 S.) (2009)

Danylyuk, S., Juschkin, L., Brose, S., Bergmann, K., Loosen, P. [u.a.]:
XUV interference lithography for sub-10 nm patterning
JARA FIT Jülich-Aachen Research Alliance - Annual Report 2008 pp. 49-50, (2009)

Banyay, M., Juschkin, L., Bücker, T., Loosen, P., [u.a.]:
XUV metrology: Surface analysis with Extreme Ultraviolet Radiation
Proc. SPIE 7361, 736113- (12 S.), (2009)

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