Gisch, I., Schröder, S., Glabisch, S., Brose, S., Danylyuk, S., Stollenwerk, J., Holly, C.:
Broadband reflective spectrometer for high-resolution spectral characterization of radiation sources.
SPIE Photomask Technology + EUV Lithography, 29 September - 3 October 2024, Monterey, California, US.
Proc. Vol. 13215, International Conference on Extreme Ultraviolet Lithography 2024, 1321515, (2024)
https://doi.org/10.1117/12.3034671
Brose, S., Danylyuk, S., Lüttgenau, B., Gisch, I., Lohmann, L., Stollenwerk, J., Holly, C.:
Development of an ultra-compact inline transmission grating spectrograph for extreme ultraviolet wavelengths.
SPIE Photomask Technology + EUV Lithography, 1-6 October 2023, Monterey, California, US.
Proc. Vol. 12750, International Conference on Extreme Ultraviolet Lithography 2023; 127500Q (2023)
http://dx.doi.org/10.1117/12.2683682
Lüttgenau, B., Panitzek, D., Danylyuk, S., Brose, S., Stollenwerk, J., Loosen, P., Holly, C.:
Design of an efficient illuminator for partially coherent sources in the extreme ultraviolet.
APPLIED OPTICS 61(11), 3026-3033 (2022)
http://dx.doi.org/10.1364/ao.452204 (Open Access)
Lüttgenau, B., Brose, S., Danylyuk, S., Stollenwerk, J., Holly, C.:
Toward the resolution limit of Talbot lithography with compact EUV exposure tools.
SPIE Photomask Technology + EUV Lithography, 25-29 September 2022, Monterey, California, United States.
International Conference on Extreme Ultraviolet Lithography 2022 (Proc of SPIE 12292), 1229208, (12 S.), (2022)
http://dx.doi.org/10.1117/12.2641693
Pollentier, I., Timmermans, M., Huyghebaert, C., Brems, S., Gallagher, E., Lüttgenau, B., Brose, S.:
EUV scattering from CNT pellicles: measurement and control.
SPIE Advanced Lithography, 2021, Online Only.
Extreme Ultraviolet (EUV) Lithography XII (Proc. SPIE 11609), 1160911- (9 S.), (2021)
https://doi.org/10.1117/12.2584718
Ghafoori, M., Bahrenberg, L., Glabisch, S., Schröder, S., Danylyuk, S., Brose, S., Stollenwerk, J., Juschkin, L., Loosen, P.:
Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization.
SPIE Advanced Lithography 2021, Online Only.
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV,(Proc. SPIE 2021) 11611, (14 S.), (2021)
https://doi.org/10.1117/12.2584738
Grube, M., Schille, B., Schirmer, M., Gerngroß, M, Hübner, U, Voigt, P, Brose, S.:
Medusa 82 - Hydrogen silsesquioxane based high sensitivity negative-tone resist with long shelf-life and grayscale lithography capability.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 39, 12602- (2021)
https://doi.org/10.1116/6.0000542
Schröder, S., Bahrenberg, L., Lüttgenau, B., Glabisch, S., Brose, S., Danylyuk, S., Stollenwerk, J., Loosen, P.:
Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet.
SPIE Advanced Lithography, 2021, Online Only.
Proce. Volume 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV; 116111M- (14 S.), (2021)
https://doi.org/10.1117/12.2583830
Lüttgenau, B., Brose, S., Danylyuk, S., Stollenwerk, J., Loosen, P., Holly, C.:
Design and realization of an in-lab EUV dual beamline for industrial and scientific applications.
SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY | 27 SEPTEMBER - 8 OCTOBER 2021.
Proceedings Vol.11854, International Conference on Extreme Ultraviolet Lithography 2021; 1185419 (2021)
https://doi.org/10.1117/12.2600935
Thoß, A., Bergmann, K.:
Extrem-UV Licht erschließt sich die Nanowelt.
MaschinenMarkt, 47739242- (2021)
Pollentier, I., Timmermans, M., Huyghebaert, C., Brems, S., Gallagher, E., Lüttgenau, B., Brose, S.:
EUV scattering from carbon nanotube pellicles: measurement and control.
Journal of Micro/Nanolithography MEMS, and MOEMS 11674, 21007- (2021)
http://dx.doi.org/10.1117/1.jmm.20.2.021007
Bahrenberg, L., Danylyuk, S., Glabisch, S., Ghafoori, M., Schröder, S., Brose, S., Stollenwerk, J., Loosen, P.:
Characterization of nanoscale gratings by spectroscopic reflectometry in the extreme ultraviolet with a stand-alone setup.
OPTICS EXPRESS 28, 20489-20502 (2020)
https://doi.org/10.1364/OE.396001
Lüttgenau, B., Brose, S., Choi, S., Panitzek, D., Danylyuk, S., Lebert, R., Stollenwerk, J., Loosen, P.:
Design and realization of an industrial stand-alone EUV resist qualification setup.
SPIE Photomask Technology + EUV Lithography, 2020, Online Only. Extreme Ultraviolet Lithography 2020 (Proc. SPIE 2020), 115171, 115171F (12 S.), (2020) http://dx.doi.org/10.1117/12.2572803
Schröder, S., Bahrenberg, L., Eryilmaz, N. K., Glabisch, S., Danylyuk, S., Brose, S., Stollenwerk, J., Loosen, P.:
Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings.
SPIE Photomask Technology + EUV Lithography, 2020, Online Only. Extreme Ultraviolet Lithography 2020 (Proc. SPIE 2020), 11517, 115170S (14 S.),(2020)
https://doi.org/10.1117/12.2573148
Bahrenberg, L., Glabisch, S., Danylyuk, S., Ghafoori, M., Schröder, S., Brose, S., Stollenwerk, J., Loosen, P:
Nanoscale grating characterization through EUV spectroscopy aided by machine learning techniques.
SPIE Advanced Lithography, 23-27 February 2020, San Jose, California, United States.
Metrology, Inspection, and Process Control for Microlithography XXXIV (Proc. of SPIE), 11325, 113250X (8 S.), (2020)
https://doi.org/10.1117/12.2550508
Lüttgenau, B., Brose, S., Danylyuk, S., Stollenwerk, J., Loosen, P:
Novel high-contrast phase-shifting masks for EUV interference lithography.
SPIE Advanced Lithography, 23-27 February 2020, San Jose, California.
Extreme Ultraviolet (EUV) Lithography XI (Proc. of SPIE), 113231Q, (11 S.) (2019).
https://doi.org/10.1117/12.2551856
Deuter, V., Grochowicz, M., Brose, S., Biller, J., Danylyuk, S., Taubner, T., Siemion, A., Grützmacher, D., Juschkin, L.:
Computational proximity lithography with extreme ultraviolet radiation.
OPTICS EXPRESS 28, 27000-27012 (2020)
https://doi.org/10.1364/OE.398805
Brose, S., Danylyuk, S., Grüneberger, F., Gerngroß, M., Stollenwerk, J., Schirmer, M., Loosen, P.:
Industrial photoresist development with the EUV laboratory exposure tool: mask fabrication, sensitivity and contrast.
SPIE Photomask Technology + EUV Lithography, 2019, Monterey, CA, 15-19 September 2019.
International Conference on Extreme Ultraviolet Lithography 2019 (Proc. of SPIE) 11147, 111471I- (9 S.) (2019).
https://doi.org/10.1117/12.2536794
Bahrenberg, L., Glabisch, S., Ghafoori, M., Brose, S., Danylyuk, S., Stollenwerk, J., Loosen, P.:
Laboratory-based EUV spectroscopy for the characterization of thin films, membranes and nanostructured surfaces.
SPIE Photomask Technology + EUV Lithography, 2019, Monterey, CA, 15-19 September 2019.
International Conference on Extreme Ultraviolet Lithography 2019 (Proc. of SPIE) 11147, 111471X- (6 S.) (2019).
https://doi.org/10.1117/12.2536884
Brose, S., Danylyuk, S., Bahrenberg, L., Lebert, R., Stollenwerk, J., Loosen, P., Juschkin, L.:
EUV-LET 2.0: a compact exposure tool for industrial research at a wavelength of 13.5nm.
SPIE Advanced Lithography, 2019, Monterey, CA, 15-19 September 2019.
Extreme Ultraviolet (EUV) Lithography X 2019 (Proc. of SPIE) 10957, 109571K, (11 S.), (2019).
https://doi.org/10.1117/12.2513755
Bahrenberg, L., Danylyuk, S., Michels, R., Glabisch, S., Ghafoori, M., Brose, S., Stollenwerk, J., Peter Loosen, P.:
Spectroscopic reflectometry in the extreme ultraviolet for critical dimension metrology.
SPIE Advanced Lithography 2019, San Jose, 24-28 February 2019, San Jose, California.
Metrology, Inspection, and Process Control for Microlithography XXXIII (Proc. of SPIE), 109591X, (6 S.) (2019).
https://doi.org/10.1117/12.2513173
von Wezyk, A., Andrianov, K., Wilhein, T., Bergmann, K.:
Target materials for efficient plasma-based extreme ultraviolet sources in the range of 6 to 8 nm.
JOURNAL OF PHYSICS D: APPLIED PHYSICS 52, 505202- (2019)
https://doi.org/10.1088/1361-6463/ab4317
Bahrenberg, L., Herbert, S., Mathmann, T., Danylyuk, S., Stollenwerk, J., Loosen, P.:
Design of structured YAG:Ce scintillators with enhanced outcoupling for image detection in the extreme ultraviolet.
OPTICS LETTERS 42, 3848-3851 (2017)
https://doi.org/10.1364/OL.42.003848
Brose, S., Danylyuk, S., Bahrenberg, L., Lebert, R., Loosen, P., Juschkin, L.:
Optimized phase-shifting masks for high-resolution resist patterning by interference lithography.
International Conference on Extreme Ultraviolet Lithography 2017, September 11 - 14, 2017,
Monterey, CA. Proc. of SPIE Vol. 10450, (12 S.), (2017)
https://doi.org/10.1117/12.2280582
Vieker, J.,Bergmann, K. :
Influence of the electrode wear on the EUV generation of a discharge based extreme ultraviolet light source.
JOURNAL OF PHYSICS D: APPLIED PHYSICS 50, 345601- (2017)
https://doi.org/10.1088/1361-6463/aa7c9f
Bahrenberg, L., Danylyuk, S., Brose, S., Pollentier, I., Timmermans, M., Gallagher, E., Stollenwerk, J., Loosen, P.:
Characterization of pellicle membranes by lab-based spectroscopic reflectance and transmittance measurements in the extreme ultraviolet.
International Conference on Extreme Ultraviolet Lithography 2017, September 11 - 14, 2017, Monterey, CA. Proceedings of SPIE Vol.10450 (7 S.), (2017)
https://doi.org/10.1117/12.2280579
Bußmann, J., Odstrčil, M., Teramoto, Y., Juschkin, L.:
Ptychographic imaging with partially coherent plasma EUV sources.
Advanced Optical Technologies 6; 459-466 (2017)
https://doi.org/10.1515/aot-2017-0050
Carstens,H., Högner, M., Saule, T., Holzberger, S., Lilienfein, N., Guggenmos, A., Jocher, C., Eidam, T., Esser, D., Tosa, V. Pervak, V., Limpert, J., Tünnermann A., Kleineberg, U., Krausz, F., Pupeza, I..
Cavity-enhanced high-harmonic generation at 250 MHz.
High Intensity Lasers and High Field Phenomena 2016. Long Beach, California, United States, 20–22 March 2016. Paper HM6B.6; (2016)
https://doi.org/10.1364/HILAS.2016.HM6B.6
Fraunhofer-Institut für Lasertechnik ILT
